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Fujifilm Athmospheric Plasma

Key benefits

The atmospheric plasma glow (APG) technology ensures very uniform surface exposure. There is no need for vacuum pumps, load locks and reactor vessels because the plasma is generated under atmospheric conditions. Together with the standard high frequency power supply a very high power density can be achieved. These factors lead to a significant reduction of the footprint of the equipment and to a low cost of ownership. Thanks to the electrode geometry scaling up to wide width is straightforward.

Due to the specific reactor design the process can be operated in low cost gases like argon, nitrogen and even air-like gas mixtures. The perfect control of the gas composition in the plasma reactor demonstrates that very high precursor utilization rates can be achieved.

Other key benefits of the atmospheric plasma technology can be summarized as follows:

  • No dangerous effluents or chemicals required
  • Process gas based on nitrogen and argon carrier gas (helium-free)
  • Environmental friendly (high process efficiency and precursor utilization > 80%)
  • Versatile processing from high end barrier deposition to dedicated surface modification
  • Compatibility with other atmospheric processes

 

key-benefits combined-benefits
Combined benefits of atmospheric plasma glow technology

Due to the specific reactor design the process can be operated in low cost gases like argon, nitrogen and even air-like gas mixtures. The perfect control of the gas composition in the plasma reactor demonstrates that very high precursor utilization rates can be achieved.

This Life+ project is supported by the European Commission.
© Fujifilm 2021